LEO DSM 940a SEM EBL For Sale
| Model Year: | 1997 |
| Quantity: | 1 |
| Condition: | Complete system |
| Serial No: | Available upon request |
| Availability: | SOLD |
Configuration:
LEO DSM 940a SEM with Raith Elphy Plus Electron Beam Lithography upgrade
Resolution: 4 nm (W), 3.5 nm (LaB6)
Acceleration voltage range: 490V to 30 kV
Magnification:
15x - 300Kx at 7mm working distance
40x - 300Kx at 4mm working distance
Beam currents for a W cathode: 1 pA and 3 uA with beam current stability better than 0.1%/h
Chamber size: 270W x 310D x 170H (mm)
RAITH Elphy Plus nanolithography conversion system (added in 2005)
- 16 bit digital pattern generator
- 2" Interferometric laser stage: Laser, control units
- Beam blanker
- Raith Elphy Plus software package, version 3.0
- Pattern generator frequencies: Up to 2.66 MHz
- Minimum dwell time: 375 ns
Standard SE detector and CCD camera
Roughing pump is not included
Comments:
This system has been powered down since 2009. It is being offered in as-is condition. It is located at AMO facility in Aachen, Germany.
There are two known issues:
- Due to a faulty IC in the extractor current meter circuit, the extractor current cannot be measured at the moment, therefore no beam can be shaped.
- The laser stage does not work properly. This might be caused by a rough fiber facet at the interface between the laser source and the stage
