Wafer: 8" , 6" or 4" (for other sizes, please inquire)
Throughput:  85wph  (60 shot) 22mm ( 8” Wafer)
Throughput: 110wph (32shot) 22mm ( 6” Wafer)
Reticle: 6" (Nikon Style or Canon Style reticle loader available)

General Specification and Information:

Model:  FPA 3000 EX5 (Deep Ultra Violet)
First year available:  1998
Lens Type:  ULEX25
Stage Type:  FLAT (Fast Liner motor air guided Transfer stage)
Chamber Type:  CD110

Projection Optics
Projection Magnification:  1/5 X
Exposure Light:  (248nm DUV)
Numerical Aperture:  (0.63~0.45 in 0.01 increments)
Field Size:  22x22 mm or 22x26 mm is optional

Standard Illumination
Exposure Light:  DUV (Deep Ultra Violet)
Light Source KrF Excimer Laser CYMER/ELS-5300
Intensity:  Min. 2800 w/m2
Uniformity:  +/- 1.2%
Masking Blade Accuracy:  Max. +/- 60 µm

Printing Performance
Resolution:  <0.22µm or Less
Depth of Focus:  Min. R 0.8µm
Image Surface Inclination:  Min. R 0.25µm
Distortion:  <±0.030µm 

Focus/Leveling Performance
Focus Repeatability:  <0.10µm (3sigma)
Leveling Repeatability:  <6ppm (3sigma)
Minimum Compensation Range:  >100ppm 

Standard Stage Specification
Step Accuracy:  <0.030µm (3sigma)
Scaling:  <±0.5ppm
Orthogonality:  <±0.5ppm

Standard Alignment Specification
Reticle Rotation Accuracy:  <±.01µm
Wafer Alignment:  <0.045µm mean + 3sigma
Reticle Rotation Repeatability:  <R0.02µm)

Reticle:
Standard Size:  6" square t=0.25" ( Particle checker)
Material:  Quartz
Pattern Material:  2 layer CR, 3 Layer CR
Pellicle Frame:  Pattern Side only Stand Off= 6.3mm

Reticle Particle Checker Specification
Detection Resolution:
Pattern Surface:   >0.6µm
Glass Surface:-  >15µm
Pellicle Surface:  >20µm

Detection Repeatability: >95%

Environmental Chamber Specification
Cleanness:  Class 1(>0.1µm)

Chamber Specifications:
Chamber Type:  CD110
Air Conditioner:  Y77-0615 (CC159XD0)
Refrigerant:  R407C
Gram (g):  4000
Pounds (lbs):  8.819